Positive photoresist developer

From LSI to VLSI, the development of semiconductor devices with a higher degree of integration and miniaturization has rapidly progressed. For the fabrication of these devices, high-purity TMAH(Tetramethyl ammonium hydroxide) with minimized impurity-ion and dust content is required. Ultrapure TMAH, is recommended as an optimized positive resistance developer which can meet the severe purity requirements in the coming age of higher-degree integration. Manufactured through our unique proprietary process in which neither halides nor organic acid salts are used, this product is characterized by its extremely small impurity anion/cation contents.